ASSA (Advanced Spatial Signature Analysis) from AOVtech detects and identifies spatial patterns in defect files, bin map files and failed bit files.
Identifying spatial patterns allows fast diagnosis and elimination of manufacturing problems.
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Proactive inline production monitoring tool used by major semiconductor fabs and foundries. |
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Detects defect spatial signatures on patterned and un-patterned wafers. |
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Comprehensive built-in library requires no training or configuration - results are consistent. |
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Multiple algorithms allow detection of the widest range of pattern types. |
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Automatically detects new and unknown patterns. |
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Monitors adder defects by count and by spatial pattern. |
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Allows historical investigation of specific patterns in multiple wafers and lots. |
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Supports defocus and reticle contamination. |
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Predicts the probable source of defects by tool type. |
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Distributed and supported in Europe by Waferdata. |
Please
Contact Us or visit the
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